国产10nm级光刻机实现交付！

[redot]

.

[TSG]

今天的任务是转进10纳米拿五元嘛盹盹吨LOL

[Rabboni]

关键是良品率是多少？

[lahei]

关键是良品率是多少？

如果是交付必然是正常良品率

[Rabboni]

码了个八字，怪不得耗子最近有点歇斯底里。泥马饭碗快被天朝砸了，瓦特法克。

[verdelite]

关键是良品率是多少？

这不是关键；关键是楼主说的是个谣言。交付的是10nm级“压”印机。

[zmimy]

这不是关键；关键是楼主说的是个谣言。交付的是10nm级“压”印机。

五毛楼主天天撒谎

[Westin]

天天都是赢麻了，日日皆为大便局

[krzkrz]

.

不懂 啥叫10nm级光刻机 比耗子哥最牛逼的13.5nm级光刻机还要牛逼3.5nm?

[redot]

傻逼大约不知道光刻机，压印机有什么区别
跟不知道3nm5纳米是怎么来的，物理线宽是多少。。。
蠢傻

这不是关键；关键是楼主说的是个谣言。交付的是10nm级“压”印机。

果然世人皆傻，只有UV是光刻机，压印NIL不是光刻机吗？
漏了哦。。。nil压印比主流？UV技术效率更高，特别是更新到GATT工艺以后。。。。

要学习，不然就真的世人皆傻了啊

[redot]

事实上，业内都知道DUV EUV 光刻的“纳米”是什么游戏

https://m.36kr.com/p/1918683414601731

[redot]

站内帖子：业内都知道DUV EUV 光刻的“纳米”是什么游戏

各位鸵鸟不要捏着鸡鸡充六指了，好不好，笑死人了

[redot]

聪明的梅花，太聪明了
于是一事无成

[redot]

搂住不说，也许这里的僵菌不明白10纳米压印是什么水平
zcanon2024年公布的最新nil是14nm，可以做等效DUV euv的芯片 （这个是列入对土共禁运的制裁名单的设备）
虽然工艺上，土共还有很多路要走，做5纳米，3 纳米还不现实
但善其事的利器已经ready
这就是现实。。。而gatt工艺，土共没有落后

很快，各位就会发现，芯片已经需要归入“黄昏工业”了。。。。
呵呵

[Linjiaojiao]

搂住不说，也许这里的僵菌不明白10纳米压印是什么水平
zcanon2024年公布的最新nil是14nm，可以做等效DUV euv的芯片 （这个是列入对土共禁运的制裁名单的设备）
虽然工艺上，土共还有很多路要走，做5纳米，3 纳米还不现实
但善其事的利器已经ready
这就是现实。。。而gatt工艺，土共没有落后

很快，各位就会发现，芯片已经需要归入“黄昏工业”了。。。。
呵呵

Sb
nano imprint 美国公司的坟头树一个人都抱不住 还骗了叔工作前公司几百万投资
美国骗不去下去日本骗
日本骗不下去中国骗

[redot]

EUV (Extreme Ultraviolet) lithography excels in high-resolution applications like advanced logic chips due to its superior precision, while NIL (Nanoimprint Lithography) offers a cost-effective alternative for niche markets like photonics and biotech, though it lags EUV in resolution and faces challenges with defectivity. The choice between the two depends on a manufacturer's need for extreme resolution versus cost, with EUV favored for cutting-edge performance and NIL for less demanding applications or when cost is a major constraint.
EUV Lithography
Method:
Uses mirrors and an extreme ultraviolet light source (13.5nm) to project a pattern onto the wafer.
Pros:
Superior Resolution: Achieves the smallest feature sizes required for leading-edge logic chips.
Compatibility: Integrates with existing advanced semiconductor manufacturing processes.
Cons:
High Cost: Requires very expensive and complex equipment.
Complexity: Involves advanced optics and high-power light sources.
Best For:
High-performance logic chips and other leading-edge semiconductor applications where ultimate precision is paramount.
Nanoimprint Lithography (NIL)
Method:
Physically stamps a pattern from a master mold onto a UV-sensitive resist on the wafer, similar to a printing press.
Pros:
Cost-Effective: Significantly lower capital investment than EUV systems.
Simplicity: Eliminates the need for complex light sources and optics.
Versatility: Suitable for a wide range of applications, including photonics and bio-MEMS.
Potential for High Throughput: Can process wafers faster than EUV in some cases.
Cons:
Lower Resolution (Historically): While improving, it generally lags behind EUV for the most advanced nodes.
Defectivity: The physical stamping process can introduce defects, requiring ongoing improvement.
Template Degradation: Master templates can degrade over time, requiring cleaning and replacement.
Best For:
Niche applications and markets where cost is a critical factor, and the highest resolution is not the primary requirement.
Key Differences in a Nutshell
Process: EUV uses light projection, while NIL uses physical stamping.
Cost: NIL is much cheaper to implement than EUV.
Resolution: EUV offers superior resolution for cutting-edge chips.
Applications: EUV is for high-end logic chips, and NIL is for photonics, biotech, and other specialized fields.

[redot]

Sb
nano imprint 美国公司的坟头树一个人都抱不住 还骗了叔工作前公司几百万投资
美国骗不去下去日本骗
日本骗不下去中国骗

呵呵，和熔盐堆一样。。。美国苏联印度都被骗，中国从废纸堆里捡起来搞出了商转。。。。

[redot]

还有绝不可能的钢材
站内帖子：绝对不可能：中国超级钢可用于核聚变

[krzkrz]

.

米华是不是在国外呆久了变傻了 还是假装外宾看不懂？

这么简单的一个吹牛逼骗钱的项目 米华竟然能上钩
国外呆久了 智商真的下降的厉害

[Linjiaojiao]

米华是不是在国外呆久了变傻了 还是假装外宾看不懂？

这么简单的一个吹牛逼骗钱的项目 米华竟然能上钩
国外呆久了 智商真的下降的厉害

这SB是鼻屎华